发明名称 MANUFACTURING METHOD OF THIN SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin substrate by which a substrate, such as a liquid crystal panel is easily made thin, without making breakage and bending of a glass substrate generated. <P>SOLUTION: The manufacturing method of the thin substrate has a glass substrate patterning step P4 for selectively thinly forming a panel region to be a flat region of a light-transmitting substrate, a substrate element forming step P8 for forming a substrate element on at least one surface in the thinly formed panel region and outer edge region removing steps P22 and P25 for removing an outer edge region that is a part, except the panel region of the light transmissive substrate after the substrate element forming step P8. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008216835(A) 申请公布日期 2008.09.18
申请号 JP20070056692 申请日期 2007.03.07
申请人 EPSON IMAGING DEVICES CORP 发明人 MATSUO MUTSUMI
分类号 G02F1/1333;G02F1/1335;G02F1/1339;G02F1/1343;G09F9/00 主分类号 G02F1/1333
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