发明名称 |
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM |
摘要 |
A substrate processing apparatus includes: a mounting table to have the substrate placed thereon in a process chamber; a first temperature adjusting mechanism temperature-adjusting the substrate placed on the mounting table; a lifter mechanism lifting up the substrate from the mounting table in the process chamber; and a second temperature adjusting mechanism temperature-adjusting the substrate lifted up from the mounting table by the lifter mechanism, wherein the first temperature adjusting mechanism and the second temperature adjusting mechanism temperature-adjust the substrate to different temperatures respectively.
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申请公布号 |
US2008223399(A1) |
申请公布日期 |
2008.09.18 |
申请号 |
US20080047649 |
申请日期 |
2008.03.13 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ONISHI TADASHI |
分类号 |
B08B7/00;B08B13/00;H01L21/302;H01L21/67 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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