发明名称 Apparatus, systems and methods for removing liquid from workpiece during workpiece processing
摘要 Apparatus, systems and methods remove liquid from a workpiece. A first station subjects a workpiece to processing that leaves a liquid on a surface of the workpiece. A second station is disposed at a location spaced apart from the first station. A porous member is disposed between the first and second stations. The porous member has a liquid-phyllic surface that faces the workpiece and is spaced from a surface of the workpiece by a gap. The porous member has a length in a direction perpendicular to a movement direction in which the workpiece moves from the first station to the second station, the length being at least as large as a dimension of the workpiece in the direction perpendicular to the movement direction.
申请公布号 US2008225248(A1) 申请公布日期 2008.09.18
申请号 US20080073865 申请日期 2008.03.11
申请人 NIKON CORPORATION 发明人 POON ALEX KA TIM;KHO LEONARD WAI FUNG;KESWANI GAURAV;COON DEREK
分类号 G03B27/42;G03B27/52 主分类号 G03B27/42
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