发明名称 |
IMMERSION FLUIDS FOR LITHOGRAPHY |
摘要 |
Compositions for use as immersion fluids are described. In general, the immersion fluids can be utilized to perform lithography at short wavelengths (e.g., in a range from about 120 nm to about 260 nm). Some embodiments can be used in a range of actinic radiation between about 140 nm and about 160 ran (e.g., about 157 nm). Immersion fluids can exhibit any number of advantageous features including a relatively high index of refraction (e.g., greater than about 1, or greater than about 1.3, or about greater than about 1.4) and/or a relatively low absorbance (e.g., lower than about 2 µm<SUP>-1</SUP>, or lower than about 1 µm<SUP>-1</SUP>, or lower than about 0.5 µm<SUP>-</SUP> |
申请公布号 |
WO2007140012(A3) |
申请公布日期 |
2008.09.18 |
申请号 |
WO2007US12648 |
申请日期 |
2007.05.29 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY;FEDYNYSHYN, THEODORE, H.;POTTEBAUM, INDIRA |
发明人 |
FEDYNYSHYN, THEODORE, H.;POTTEBAUM, INDIRA |
分类号 |
G03F7/20;C07F7/18;C07F7/30 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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