METHOD OF COATING APPLICATION, COATING APPLICATION APPARATUS AND COMPUTER READABLE STORAGE MEDIUM

摘要

In the coating step, a substrate is rotated at a high speed, and while maintaining the condition, a resist liquid is spouted through a first nozzle onto a central area of the substrate to thereby attain application of the resist liquid onto the substrate. In the subsequent planarizing step, the rotating speed of the substrate is decreased, and the resist liquid on the substrate is planarized by rotating the substrate at a low speed. The spouting of the resist liquid through the first nozzle in the coating step is continued until the middle of the planarizing step. In the discontinuation of the spouting of the resist liquid in the planarizing step, the first nozzle is shifted so as to shift the position of spouting of the resist liquid from the central area of the substrate. Accordingly, the resist liquid can be applied uniformly within the plane of the substrate.