| 摘要 |
An exposure apparatus EX includes an optical unit U which defines a first exposure area AR1 and a second exposure area AR2 at different positions in a first direction and which radiates exposure light beams EL onto the first and second exposure areas respectively; and a first movement system 4 which moves the first exposure area and the second exposure area relative to a substrate P in the first direction. The exposure light beams EL are radiated by the optical unit onto the first and second exposure areas respectively while moving the first and second exposure areas relative to a predetermined area on the substrate P. Accordingly, the predetermined area on the substrate P is subjected to multiple exposure with an image of a first pattern formed by the exposure light beam radiated onto the first exposure area and an image of a second pattern formed by the exposure light beam radiated onto the second exposure area. The deterioration of the throughput can be suppressed, and the substrate can be subjected to the multiple exposure efficiently.
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