| 摘要 |
<p>Negatively working, radiation sensitive element comprises a carrier and a radiation sensitive coating comprising at least a component such as photo initiator, sensitizer system and co-initiator; at least a radically polymerizable oligomer A, which is obtained by reacting triisocyanate with: at least an acryl- or methacrylmonomer with two free hydroxyl (OH)-groups and at least an acryl- or methacryl group, and at least a compound having a free OH-group, at least an acryl- or methacryl group and at least a polyalkyleneoxide chain in the molecule. Negatively working, radiation sensitive element comprises a carrier and a radiation sensitive coating comprising at least a component such as photo initiator, sensitizer system and coinitiator that absorbs radiation at a wave length of 250-1200 nm; at least a radically polymerizable oligomer A (exhibiting an average molecular weight of 3500-9000 g/mol by gel-permeation chromatography), which is obtained by reacting triisocyanates with: at least an acryl- or methacrylmonomer with two free hydroxyl (OH)-groups and at least an acryl- or methacryl group, and at least a compound (A) having a free OH-group, at least an acryl- or methacryl group and at least a polyalkyleneoxide chain in the molecule, where the amount of acryl- or methacrylmonomer is 2-20 mol.%, based on the total quantity of the used acryl- or methacryl compound with OH-functionality. INDEPENDENT CLAIMS are included for: (1) the preparation of the element comprising irradiating the radiation-sensitive element with the radiation on the radiation-sensitive coating of the element exhibiting the photo initiator or sensitizer co-ordinated wavelength; and removing the non-irradiated area; (2) a radiation sensitive composition comprising the negatively working, radiation sensitive element; and (3) the preparation of the defined radiation sensitive element comprising applying the defined radiation sensitive composition on a pretreated or non-pretreated carrier, and drying.</p> |
