发明名称 |
Positive resist composition containing a resin for hydrophobilizing resist surface, method for production thereof |
摘要 |
A resin is to be added to a resist composition and localized on a surface of a resist film so as to hydrophobilize the surface of a resist film and has a peak area of a high molecular weight component having a molecular weight of 30,000 or more is 0.1% or less of a total peak area in a molecular weight distribution measured by gel permeation chromatography. |
申请公布号 |
EP1970760(A1) |
申请公布日期 |
2008.09.17 |
申请号 |
EP20080004852 |
申请日期 |
2008.03.14 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KANDA, HIROMI |
分类号 |
G03F7/004;G03F7/039;G03F7/075;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|