发明名称 Positive resist composition containing a resin for hydrophobilizing resist surface, method for production thereof
摘要 A resin is to be added to a resist composition and localized on a surface of a resist film so as to hydrophobilize the surface of a resist film and has a peak area of a high molecular weight component having a molecular weight of 30,000 or more is 0.1% or less of a total peak area in a molecular weight distribution measured by gel permeation chromatography.
申请公布号 EP1970760(A1) 申请公布日期 2008.09.17
申请号 EP20080004852 申请日期 2008.03.14
申请人 FUJIFILM CORPORATION 发明人 KANDA, HIROMI
分类号 G03F7/004;G03F7/039;G03F7/075;G03F7/20 主分类号 G03F7/004
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