发明名称 |
Polishing head testing with movable pedestal |
摘要 |
A polishing head 16 is tested in a test station 10 having a pedestal 19 for supporting a test wafer and a controllable pedestal actuator 294 to move a pedestal central wafer support surface and a test wafer toward the polishing head 16. In another aspect of the present description, the test wafer may be positioned using a positioner having a first plurality of test wafer engagement members positioned around the pedestal central wafer support surface. In another aspect, the wafer position may have a second plurality of test wafer engagement members positioned around an outer wafer support surface disposed around the pedestal central wafer support surface and adapted to support a test wafer. The second plurality of test wafer engagement members may be distributed about a second circumference of the ring member, the second circumference having a wider diameter than the first circumference. Additional embodiments and aspects are described and claimed.
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申请公布号 |
EP1970161(A1) |
申请公布日期 |
2008.09.17 |
申请号 |
EP20080152801 |
申请日期 |
2008.03.14 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SCHMIDT, JEFFREY PAUL;ROHDE, JAY S.;MEYER, STACY JON |
分类号 |
B24B7/22;G01M99/00;B24B37/04 |
主分类号 |
B24B7/22 |
代理机构 |
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主权项 |
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地址 |
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