| 发明名称 |
Phenolic polymers and photoresists comprising same |
| 摘要 |
The present invention relates to new polymers that contain phenolic groups spaced from a polymer backbone and photoacid-labile group. Preferred polymers of the invention are useful as a component of chemically-amplified positive-acting resists. |
| 申请公布号 |
EP1970762(A1) |
申请公布日期 |
2008.09.17 |
| 申请号 |
EP20080250839 |
申请日期 |
2008.03.12 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
CAMERON, JAMES F. |
| 分类号 |
G03F7/039;C08F222/12;C08K5/43;C09D5/44;H01L21/027;H01L21/266;H01L21/60 |
主分类号 |
G03F7/039 |
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