Lithographic apparatus and device manufacturing method
摘要
<p>A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.</p>
申请公布号
EP1970763(A2)
申请公布日期
2008.09.17
申请号
EP20080012007
申请日期
2005.12.01
申请人
ASML NETHERLANDS BV
发明人
HENNUS, PIETER RENAAT MARIA;ERTENS, JEROEN JOHANNES SOPHIA MARIA;SMULDERS, PATRICK JOHANNES CORNELUS HENDRIK;SMITS, PETER