Method for roughening semiconductor surface,申请号EP20020100242-传众专利搜索

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发明名称	Method for roughening semiconductor surface
摘要
申请公布号	EP1345275(B1)	申请公布日期	2008.09.17
申请号	EP20020100242	申请日期	2002.03.13
申请人	SAKAI, SHIRO;NITRIDE SEMICONDUCTORS CO., LTD.	发明人	SAKAI, SHIRO;LACROIX, YVES
分类号	H01L21/3065;H01L21/302;H01L21/033;H01L21/308;H01L33/32	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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