HOT WALL EPITAXY(EVAPORATION) HAVING MANY SUBSTRATE HOLDERS

摘要

PURPOSE: A hot wall epitaxy(evaporation) performs many evaporation processes at the same time, increases the number of substrate holders, enhances a production quantity per a unit time, and produces many thin films of good quality. CONSTITUTION: A hot wall epitaxy device includes a substrate holder(210), and a hot wall part(110). The substrate holders(210) are many holders which can be simultaneously inserted into many processes. A holder moving part moves the many holders according to a process sequence. A heat sink(230) is positioned between the many holders and the hot wall, thereby cutting off a radiation heat. The hot wall part(110) accommodates a substrate and evaporation material therein, and performs evaporation. The holder moving part has many holder maintenance arms for maintaining at least one holder. Thereby, a pre process, evaporation process using a hot wall evaporation, and a postprocess are performed at the same time, a time loss is largely reduced, and a production yield increases.