发明名称 Method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index
摘要 <p>A method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index are provided. The sputter-deposition system includes a plurality of target cathodes, each of which comprises a target material having a different composition, that are powered by a single DC power supply. The plurality of target cathodes are cosputtered to deposit a layer composed of a mixture of materials on a substrate. The composite refractive index of the layer is controlled by adjusting an operating parameter of the plurality of target cathodes. Suitable operating parameters include cathode power, cathode voltage, cathode current, an angle between a cathode support and the substrate, and a flow rate of a reactive gas.</p>
申请公布号 EP1970465(A2) 申请公布日期 2008.09.17
申请号 EP20080003989 申请日期 2008.03.04
申请人 JDS UNIPHASE CORPORATION 发明人 TILSCH, MARKUS K.;SMITH, JOSEPH;GRIGONIS, MARIUS
分类号 H01J37/32;C23C14/34;C23C14/52;C23C14/54;H01J37/34 主分类号 H01J37/32
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