CLEANING METHOD OF A PROCESS CHAMBER

摘要

A cleaning method of a process chamber is provided to suppress the generation of particles by removing the generation of friction due to thermal expansion. A shower head structure is loaded into a process chamber(22) of a layer forming apparatus(20) to perform a layer forming process for depositing reactants on a surface of a heated target in process gas atmosphere. The shower head structure is used for introducing a process gas into the process chamber. When the cleaning gas is introduced from the shower head structure to the process chamber, the temperature of the shower head structure is set at the temperature higher than the temperature of a layer forming process. The temperature of the shower head structure is 130 degrees centigrade or more.