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发明名称
形成一物质层的装置
摘要
本发明提供一种用于形成物质层之装置,包含室、分隔部件、支撑部件、反应气体提供部件以及绝缘部件。此室具有用以装载基板之内部空间。分隔部件设置于此室之内部空间中,以将内部空间分隔成用于容纳基板之反应区与非反应区。支撑部件置于反应区中,用以支撑基板。反应气体提供部件放置于支撑部件上,用以向反应区提供反应气体。此绝缘部件可卸下地与分隔部件相结合,以使反应区与非反应区相互隔离。如此,可抑止支撑部件中之加热器透过分隔部件经非反应区损失热量。
申请公布号
TW200837867
申请公布日期
2008.09.16
申请号
TW097104595
申请日期
2008.02.05
申请人
SOSUL股份有限公司;高美科股份有限公司
发明人
李喜世;金根镐;朴承一;李光世;尹守远;罗宽球
分类号
H01L21/67(2006.01)
主分类号
H01L21/67(2006.01)
代理机构
代理人
詹铭文;萧锡清
主权项
地址
韩国
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