发明名称 Atomic layer deposition on micro-mechanical devices
摘要 A micro-electromechanical device or MEMS having a conformal layer of material deposited by atomic layer deposition is discussed. The layer may provide physical protection to moving components of the device, may insulate electrical components of the device, may present a biocompatible surface interface to a biological system, and may otherwise improve such devices. The layer may also comprise a combination of multiple materials each deposited with great control to allow creating layers of customizable properties and to allow creating layers having multiple independent functions, such as providing physical protection from wear and providing electrical insulation.
申请公布号 US7426067(B1) 申请公布日期 2008.09.16
申请号 US20020322195 申请日期 2002.12.17
申请人 REGENTS OF THE UNIVERSITY OF COLORADO 发明人 BRIGHT VICTOR M.;ELAM JEFFREY;FABREGUETTE FRANCOIS;GEORGE STEVEN M.;HOIVIK NILS;LEE YUNG-CHENG;LINDERMAN RYAN;TRIPP MARIE
分类号 G02B26/08 主分类号 G02B26/08
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