| 发明名称 |
METHOD, COMPOSITION AND SYSTEM FOR THE CONTROLLED RELEASE OFCHLORINE DIOXIDE GAS |
| 摘要 |
Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.
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| 申请公布号 |
CA2282348(C) |
申请公布日期 |
2008.09.16 |
| 申请号 |
CA19982282348 |
申请日期 |
1998.02.27 |
| 申请人 |
ENGELHARD CORPORATION |
发明人 |
THANGARAJ, APPADURAI;SPERONELLO, BARRY K.;YANG, XIAOLIN |
| 分类号 |
A01N59/00;A01P1/00;A23L3/3445;A23L3/358;A61L2/06;A61L2/20;A61L9/01;A61L9/015;B01D53/38;C01B11/02;C02F1/50;C02F1/76 |
主分类号 |
A01N59/00 |
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