发明名称 |
Focus test mask, focus measurement method and exposure apparatus |
摘要 |
This focus test mask is provided with a test pattern that is projected onto a wafer via a projection optical system. This test pattern includes: a plurality of line patterns that are lined up in a direction of measurement; phase shift sections that are provided in areas adjacent to each of the plurality of line patterns and that are used to shift the phase of light passing through; and reference patterns that are used to obtain an image that forms a reference when the shift in the line pattern image is measured. Spaces between the plurality of line patterns are set at a size that allows each line pattern to be regarded as equivalent to being isolated lines.
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申请公布号 |
US7426017(B2) |
申请公布日期 |
2008.09.16 |
申请号 |
US20050319051 |
申请日期 |
2005.12.28 |
申请人 |
NIKON CORPORATION |
发明人 |
KONDO SHINJIRO |
分类号 |
G03B27/52;G03B27/42;G03C5/00;G03F1/00;G03F7/20;G03F7/207 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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