发明名称 Wafer inspection device
摘要 A semiconductor substrate or wafer inspection device for detecting defects on wafer surfaces includes an air-cushion stage which can be displaced in two directions (X,Y) that are perpendicular to one another. Several air nozzles are provided for this purpose. At least one valve is connected to at least one electric control unit, the valve being configured in such a way that a normal pressure prevails in the air nozzles when the electric control unit delivers a corresponding signal.
申请公布号 US7424393(B2) 申请公布日期 2008.09.09
申请号 US20040563499 申请日期 2004.05.12
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 HALAMA MICHAEL;KREH ALBERT;SCHMIDT GUENTER
分类号 G21C17/00;G01R31/26;G01R31/28;H01L21/677;H01L21/68;H01L21/683;H01L21/687 主分类号 G21C17/00
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