发明名称 Self-aligned non-volatile memory cell
摘要 Disclosed is a self-aligned non-volatile memory cell including a small sidewall spacer electrically coupled and being located next to a main floating gate region. Both the small sidewall spacer and the main floating gate region are formed on a substrate and both form the floating gate of the non-volatile memory cell. Both are isolated electrically from the substrate by an oxide layer which is thinner between the small sidewall spacer and the substrate; and is thicker between the main floating gate region and the substrate. The small sidewall spacer can be made small; therefore, the thin oxide layer area can also be made small to create a small pathway for electrons to tunnel into the floating gate.
申请公布号 USRE40486(E1) 申请公布日期 2008.09.09
申请号 US20050176883 申请日期 2005.07.07
申请人 ATMEL CORPORATION 发明人 LOJEK BOHUMIL;RENNINGER ALAN L.
分类号 H01L21/8247;H01L29/788;H01L21/28;H01L21/336;H01L21/768;H01L27/115;H01L29/423;H01L29/76;H01L29/792;H01L29/94;H01L31/062;H01L31/113 主分类号 H01L21/8247
代理机构 代理人
主权项
地址