| 摘要 |
A chemical vapor deposition apparatus for a flat panel display is provided to prevent damage of a gas inflow pipe by preventing parasitic plasma from being generated within a gas feed-through pipe, and improve a process yield by preventing generation of particles. In a chamber, a deposition process for a flat panel display is performed. A gas inflow pipe(33) flows process gas for the deposition process into the chamber. A gas feed-through pipe(31) is connected with the gas inflow pipe and transfers the process gas to the gas inflow pipe. A parasitic plasma generation preventing unit(34) is formed in at least a partial section within the gas inflow pipe so as to be smaller than an inside diameter of the gas feed-through pipe, and prevents parasitic plasma from being generated in inside of the gas feed-through pipe during the deposition process by increasing pressure of the gas feed-through pipe. |
