Method of monitoring the light integrator of a photolithography system

摘要

A method of monitoring a light integrator of a photolithography system, wherein the photolithography system comprises a light source for illuminating different fields of a photosensitive layer and a light integrator for measuring the actual exposure doses of the illuminated fields, comprises the step of illuminating different fields of the photosensitive layer in succession. In each illumination step the actual exposure dose is measured by means of the light integrator, the actual exposure time (actualTime) is controlled so that the actual exposure dose to which a field of the photosensitive layer is exposed corresponds to a desired exposure dose, and the actual exposure time (actualTime) is fed to a monitoring system for in-line monitoring the light integrator during illumination of the fields.