发明名称 |
Composition and method for treating a semiconductor substrate |
摘要 |
The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.
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申请公布号 |
US7422019(B2) |
申请公布日期 |
2008.09.09 |
申请号 |
US20060476263 |
申请日期 |
2006.06.27 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)VZW |
发明人 |
DE WAELE RITA;VOS RITA |
分类号 |
B08B3/04;C11D3/02;C11D3/26;C11D3/30;C11D3/34;C11D7/26;C11D7/32;C11D7/34;C11D7/54;C11D11/00 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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