发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
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申请公布号 |
US7423722(B2) |
申请公布日期 |
2008.09.09 |
申请号 |
US20040766526 |
申请日期 |
2004.01.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN ALBERT JOHANNES MARIA;KUIT JAN JAAP;LOOPSTRA ERIK ROELOF;SCHRIJVER RAYMOND LAURENTIUS JOHANNES |
分类号 |
G03B27/32;H01L21/027;G03B27/42;G03F7/00;G03F7/20 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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