| 摘要 |
A substrate processing apparatus is provided to reduce costs required for the apparatus and improve productivity when processing plural processed substrates. A conveyance unit horizontally conveys a processed substrate(G) on a conveyance path as upwardly placing the processed substrate. A chamber unit(1,2,3) is installed on the conveyance path, and performs drying processing for the substrate carried by the conveyance unit. The chamber unit includes an air supply unit(81a,81b,81c) installed in a downstream side of a substrate conveyance direction, and an exhausting unit(82a,82b,82c) installed in an upstream side of the substrate conveyance direction or includes an air supply unit installed in an upstream side of the substrate conveyance direction, and an exhausting unit installed in a downstream side of the substrate conveyance direction. Drying gas is supplied by the air supply unit. The supplied drying gas is exhausted by the exhausting unit. Therefore, a drying gas flow contacted with an upper surface of the substrate conveyed into the chamber unit is formed. |
