| 摘要 |
<p>An immersion exposure apparatus and a device manufacturing method are provided to reduce the amount of residual liquid on a substrate or a top plate of a substrate stage. A projection optical system(30) projects an exposure beam from a disk onto a substrate(40). A first supply unit supplies a first liquid(L1) and is formed between the projection optical system and a substrate. The first supply unit forms a first liquid layer in a space including an optical path of the exposure beam. A second supply unit supplies a second liquid(L2) different from the first liquid to form a second liquid layer around the first liquid layer. A substrate stage(45) is used for supporting the substrate. The substrate stage includes a top plate surrounding the substrate. A contact angle of the second liquid to the top plate is larger than a contact angle of the first liquid to the top plate.</p> |
