DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER IN CONJUNCTION WITH ION CURRENT

摘要

A dosimetry using an optical emission spectrometer and a residual gas analyzer in conjunction with ion current is provided to control ion dosage in real time during a plasma process through in-situ measurement of plasma. A dosimetry using an optical emission spectrometer and a residual gas analyzer in conjunction with ion current comprises the steps of: positioning a substrate in a plasma reactor to perform a plasma process(910); generating plasma in the plasma reactor to start the plasma process by supplying RF bias to the plasma reactor(920); obtaining a ratio of at least one ion species in the plasma with respect to the entire radical in the plasma using a first sensor for monitoring at least one characteristic feature of the plasma generated in the plasma reactor; obtaining at least one characteristic feature of the RF bias power using a second sensor for monitoring at least one characteristic of the RF bias power for supplying the RF bias to the plasma reactor; and detecting a real time dose value of one or more ion species in the plasma from the at least one characteristic feature of the plasma with respect to the entire radical and the at least one characteristic feature of the RF bias power.