发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source for exposure with a relatively large output in which a solid target is rapidly and continuously supplied while carrying out excellently heat removal to the irradiation of driver laser beams. <P>SOLUTION: The extreme ultraviolet light source is equipped with a chamber in which generation of extreme ultraviolet light is carried out, a target substance supply means for coating a target substance on a wire, a wire supply means to supply the wire coated with the target substance to a prescribed position in the chamber, a driver laser which generates plasma by irradiating laser beams on the wire coated with the target substance, and a collector mirror which condenses and emits extreme ultraviolet light irradiated from plasma. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008204752(A) 申请公布日期 2008.09.04
申请号 JP20070038751 申请日期 2007.02.20
申请人 KOMATSU LTD 发明人 ABE TAMOTSU;UENO YOSHIFUMI;YABU TAKAYUKI
分类号 H05G2/00;G03F7/20;G21K5/08;H01L21/027 主分类号 H05G2/00
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