发明名称 RADIATION PATTERN CONTROL
摘要 <p>An apparatus including: a first antenna element; a second antenna element; a ground plane element for at least one of the first and second antenna elements; a first choke arranged to affect a first maximum of current density produced in the ground plane element by the first antenna element; and a second choke arranged to affect a second maximum of current density produced in the ground plane element by the second antenna element.</p>
申请公布号 WO2008104826(A1) 申请公布日期 2008.09.04
申请号 WO2007IB01678 申请日期 2007.02.28
申请人 NOKIA CORPORATION;LEHTOLA, ANTERO;ARKKO, AIMO 发明人 LEHTOLA, ANTERO;ARKKO, AIMO
分类号 H01Q1/24 主分类号 H01Q1/24
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