发明名称 COMBINATION ELLIPSOMETRY AND OPTICAL STRESS GENERATION AND DETECTION
摘要 A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.
申请公布号 WO2008008223(A3) 申请公布日期 2008.09.04
申请号 WO2007US15286 申请日期 2007.07.09
申请人 RUDOLPH TECHNOLOGIES, INC.;MEHENDALE, MANJUSHA;KOTELYANSKII, MICHAEL, J.;HOU, YANWEN;ONDERKO, JIM;TAS, GURAY 发明人 MEHENDALE, MANJUSHA;KOTELYANSKII, MICHAEL, J.;HOU, YANWEN;ONDERKO, JIM;TAS, GURAY
分类号 G01N21/00;G01B11/16;G01L1/24;G01N21/21 主分类号 G01N21/00
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