| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method, an exposure apparatus and a method for manufacturing a fine structure by which the direction and angle of an inclined face of a structure can be arbitrarily controlled when a fine structure is formed, and to provide a fine structure manufactured by the method. <P>SOLUTION: A photomask M and a work W placed close and parallel to each other are exposed while both are integrally moved in the direction where the optical axis of light exiting from a light source 2 intersects the normal line of the surface of the work W. The work W is moved along the surface of the work W with respect to the photomask so as to place the work W in the opposite side to the incident side of the light exiting from the light source 2. <P>COPYRIGHT: (C)2008,JPO&INPIT |
