| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for resist underlayer film formation capable of forming a resist underlayer film having a function as an antireflection film and also having good matching properties with a resist, and a resist underlayer film formed using the same. <P>SOLUTION: The composition for resist underlayer film formation contains a siloxane polymer component having specific repeating units. The resist underlayer film having a function as an antireflection film and also having good matching properties with a resist is obtained by forming a resist underlayer film using the composition. <P>COPYRIGHT: (C)2008,JPO&INPIT |
