METHOD OF MANUFACTURING PHOTOMASK AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

PROBLEM TO BE SOLVED: To facilitate connection between patterns of master masks. SOLUTION: The integrated circuit patterns are transferred to pattern transfer regions 12a to 12e of the product mask Md 4 by reduction stepping processing using plural sheets of the IP masks and thereafter the connection between the patterns of the pattern transfer regions 12a to 12e adjacent to each other is performed by the light shielding patterns 2j consisting of organic films formed by exposure processing using energy beams.