| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which exhibits high transmission of various radiations, especially of far-ultraviolet rays represented by KrF excimer laser, and is excellent in sensitivity, resolution, adhesion to substrates, and dry etching resistance; and a copolymer used therefor. SOLUTION: The copolymer has at least one acid-decomposable group, repeating units represented by formula (1) (wherein R1 is H or methyl; R2 is H, methyl or hydroxyl; and n is an integer of 0-2), and repeating units represented by formula (2) (wherein R3 to R10 are each independently H or a monovalent organic group). The radiation-sensitive resin composition contains the copolymer and a radiation-sensitive acid generator. |
