| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that can treat a substrate at a high level of cleanness by devising a way of supplying a process liquid and can prevent incomplete drying. SOLUTION: Supply of deionized water is stopped from a left-side jet pipe 7, and deionized water is supplied only from a right-side jet pipe 7. By so setting, a direction in which dried air is supplied and a flow of the deionized water in the vicinity of the fluid level will agree, and thus, stagnation is hard to occur in the flow of the deionized water, and particles are effectively discharged that are separated from a substrate W and are afloat in the deionized water during the cleaning time. As a result, this will prevent the particles from clinging to the substrate W picked up, thus enabling the substrate W to be processed at a high level of cleanness. Further, the fluid level will never rise in the middle part, and dried air will prevent poppling from being generated in the middle of the fluid level, which will prevent splashed liquid from adhering to the substrate W while it is being taken up, thus inhibiting incomplete drying of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT
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