| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold for nano-imprints which reduces costs of the mold. SOLUTION: In a mold 4 for nano-imprints, a resin film 3 for the mold is formed on the substrate 2 for the mold, and a mold pattern consisting of nano-order irregularities is formed in the resin film 3. The mold pattern is formed by pressing, toward the resin film 3, a mother mold original plate 1 having a mother pattern of nano-order irregularities formed by an electron beam drawing method to transfer the reversed mother pattern to the resin film 3. COPYRIGHT: (C)2008,JPO&INPIT
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