发明名称 Plasma enhanced chemical vapor desposition device having multiple sub-electrodes
摘要 An exemplary PECVD device includes a first electrode ( 21 ), a second electrode ( 22 ) parallel to the first electrode, and a radio frequency (RF) circuit ( 23 ) providing energy for the two electrodes. The first electrode includes at least two separated sub-electrodes ( 211, 212 ). The RF circuit includes an RF power supply source ( 230 ) and at least two variable resistors ( 231, 232 ). The RF power supply source is connected to the at least two sub-electrodes via the at least two variable resistors respectively. The PECVD device can deposit a uniform thin film.
申请公布号 US2008210166(A1) 申请公布日期 2008.09.04
申请号 US20080069805 申请日期 2008.02.12
申请人 INNOLUX DISPLAY CORP. 发明人 YAN SHUO-TING
分类号 C23C16/505 主分类号 C23C16/505
代理机构 代理人
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