发明名称 |
PATTERN MANAGEMENT METHOD AND PATTERN MANAGEMENT PROGRAM |
摘要 |
A pattern management method includes extracting patterns having process margins equal to or below a predetermined value from a chip layout of an integrated circuit, screening a plurality of types of representative patterns from the extracted pattern, extracting patterns closest to the most outer periphery of the chip from the representative patterns, and representatively managing the extracted patterns which is closest to the most outer periphery of the chip.
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申请公布号 |
US2008216046(A1) |
申请公布日期 |
2008.09.04 |
申请号 |
US20070958465 |
申请日期 |
2007.12.18 |
申请人 |
YOSHIDA KENJI;INOUE SOICHI |
发明人 |
YOSHIDA KENJI;INOUE SOICHI |
分类号 |
G06F17/50;G03F1/36;G03F1/68;G03F1/70;H01L21/027;H01L21/82 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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