发明名称 |
FRICTION SENSOR FOR POLISHING SYSTEM |
摘要 |
<p>A system, method and apparatus to monitor a frictional coefficient of a substrate undergoing polishing is described. A polishing pad assembly includes a polishing layer including a polishing surface, and a substrate contacting member flexibly coupled to the polishing layer having a top surface to contact an exposed surface of a substrate. At least a portion of the top surface is substantially coplanar with the polishing surface. A sensor is provided to measure a lateral displacement of the substrate contacting member. Some embodiments may provide accurate endpoint detection during chemical mechanical polishing to indicate the exposure of an underlying layer.</p> |
申请公布号 |
WO2008064268(A3) |
申请公布日期 |
2008.09.04 |
申请号 |
WO2007US85305 |
申请日期 |
2007.11.20 |
申请人 |
APPLIED MATERIALS, INC.;BENVEGNU, DOMINIC J.;SWEDEK, BOGUSLAW A. |
发明人 |
BENVEGNU, DOMINIC J.;SWEDEK, BOGUSLAW A. |
分类号 |
B24B49/00;B24B37/04;B24B49/16;G01N19/02 |
主分类号 |
B24B49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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