| 摘要 |
PROBLEM TO BE SOLVED: To improve the throughput of an exposure apparatus capable of multiply exposing substrates in a lot by using a plurality of forms for instance. SOLUTION: The exposure apparatus having a form stage for holding forms and capable of multiply exposing substrates in a lot by using the plurality of forms is provided with a calculation part 1 and a control part 2. The calculation part 1 calculates carrying time required for carrying each of the plurality of forms up to the form stage 6 on the basis of the arrangement of each of the plurality of forms before starting the processing of the lot. The control part 2 determines order for using the plurality of forms on the basis of the carrying time of each of the plurality of forms which is calculated by the calculation part 1. COPYRIGHT: (C)2008,JPO&INPIT
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