| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of evaluating line edge roughness (LER) and line-width roughness (LWR) of a photoresist resin, using a simple operation. SOLUTION: First, the photoresist resin evaluating method comprises evaluating the line edge roughness and line width roughness characteristics of the photoresist resin with the elastic modulus uniformity of a thin film of the photoresist. Secondly, the photoresist resin evaluating method comprises measuring the thin film of the photoresist in an atomic force microscope tapping method and evaluating the line edge roughness and line width roughness characteristics of the photoresist resin with the property cycle of an obtained phase image. Thirdly, the photoresist resin evaluating method comprises measuring the thin film of the photoresist in the atomic force microscope tapping method and evaluating the elastic modulus uniformity of the thin film of the photoresist with the property cycle of an obtained elastic modulus change of the thin film. COPYRIGHT: (C)2008,JPO&INPIT |
