| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint mold which is superior in releasability between the impprint mold and a transfer pattern and can carry out an optical imprint method without degrading the releasability even when the imprint method is carried out repeatedly. SOLUTION: The imprint mold has a phase displacement layer. When it is irradiated with coherent exposure light, exposure light intensity can be controlled by changing the thickness and refractive index of the phase displacement layer. By controlling the exposure light intensity, the degree of curing of a photocurable resin in a specified part can be reduced selectively, and shearing force caused by adhesion and shrinkage stress by curing can be reduced. In the process of peeling the imprint mold and the resin pattern, a part wherein the defect of the resin pattern occurs can selectively be made to be uncured, so that the occurrence of the defect of the transfer pattern can be made possible. COPYRIGHT: (C)2008,JPO&INPIT
|
