发明名称 Phase change memory devices including phase change layer formed by selective growth methods and methods of manufacturing the same
摘要 A phase change memory device including a phase change layer includes a storage node and a switching device. The switching device is connected to the storage node. The storage node includes a phase change layer selectively grown on a lower electrode. In a method of manufacturing a phase change memory device, an insulating interlayer is formed on a semiconductor substrate to cover a switching device. A lower electrode connected to the switching device is formed, and a phase change layer is selectively grown on the lower electrode.
申请公布号 US2008210924(A1) 申请公布日期 2008.09.04
申请号 US20070003146 申请日期 2007.12.20
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 SHIN WOONG-CHUL
分类号 H01L45/00 主分类号 H01L45/00
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