| 摘要 |
<p>When sheet-like work whose both front and rear surfaces are to be processed is subjected to alignment, deflection of the center part of the sheet-like work is corrected to set it parallel to a photomask. An exposure method has a supporting step for supporting a peripheral edge part (6b) of a sheet-like work (6), whose both front and rear surfaces are to be processed, by a support part (7) of a work stage (9) of an exposure device; a deflection correcting step for correcting deflection of the center part (6a) of the sheet-like work (6), which is supported on the support part (7), by introducing fluid into a hollow part (8) formed in the support part (7); an alignment step for aligning between the sheet-like work (6) having the peripheral edge part (6b) supported by the support part (7) and a photomask (3); and an exposure step for exposing the sheet-like work (6) from above the photomask (3).</p> |
