| 摘要 |
A measurement apparatus, an exposure apparatus, and a device fabrication method are provided to enhance throughput, economical efficiency, and quality of devices including semiconductor device, LCD devices, and image pickup devices. A measurement unit is inserted into an image plane of an optical system as a measuring target. A measurement mask is inserted into an object plane of the optical system as the measuring target. The measurement unit includes a light shielding board having a slit-shaped image-side opening part and a light quantity sensor for measuring the quantity of light passing through the image-side opening part. The measurement mask includes a rectangular light shielding part(212) for forming a projection image having longitudinal and lateral dimensions longer than longitudinal and lateral dimensions of the image-side opening part on the image plane of the optical system, and object-side opening parts(214a,214b) formed on both sides of the light-shielding part. The measurement apparatus measures a flare generated by the optical system by using the light quantity sensor for measuring the light quantity when the projection image covers the image-side opening part. |
