| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position measuring technique using an interferometer, capable of reducing fluctuations in measured values, and capable of reducing the influence due to vibration. <P>SOLUTION: This position measuring instrument for measuring a position of a substrate stage PST by bringing a measuring beam LPX1 reflected from the substrate stage PST into interference with a reference beam LPX2 by a beam splitter 23X is provided with a temperature stabilization part 29X for supplying temperature-controlled air to one part of an optical path for the measuring beam LPX1; and a movable duct 30X for guiding the air along the optical path, and the movable duct 30X is supported under the condition of being isolated, in view of the point of vibration from the beam splitter 23X and the substrate stage PST. <P>COPYRIGHT: (C)2008,JPO&INPIT |
