发明名称 SILOXANE POLYMER, METHOD FOR PRODUCING THE SAME, COATING LIQUID FOR FORMING POROUS FILM CONTAINING THE POLYMER, POROUS FILM AND SEMICONDUCTOR APPARATUS USING THE POROUS FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To obtain a siloxane polymer that forms a porous film having a more excellent mechanical strength than that of a conventional siloxane polymer by using a siloxane polymer being an industrially preferable material and is synthesized by a new method, a composition for forming a film containing the same, to provide a method for forming a porous film, to obtain a formed porous film and to provide a semiconductor apparatus having the built-in porous film and high performance and high reliability. <P>SOLUTION: The method for producing a siloxane polymer by hydrolysis condensation of a hydrolyzable silane compound comprises preparing a cage compound salt of a silsesquioxane represented by general formula (1): (SiO<SB>1.5</SB>-O)<SB>n</SB><SP>n-</SP>X<SP>+</SP><SB>n</SB>(wherein X is NR<SB>4</SB>; Rs are each a 1-4C straight-chain or branched-chain alkyl group and each independently the same or different; and n is an integer of 6-24) and using a siloxane polymer obtained by hydrolyzing and condensing a hydrolyzable silane compound as the cage compound salt of the silsesquioxane. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008201832(A) 申请公布日期 2008.09.04
申请号 JP20070036344 申请日期 2007.02.16
申请人 SHIN ETSU CHEM CO LTD;MATSUSHITA ELECTRIC IND CO LTD 发明人 YAGIHASHI FUJIO;HAMADA YOSHITAKA;ASANO TAKESHI;IWABUCHI MOTOAKI;NAKAGAWA HIDEO;SASAKO MASARU
分类号 C08G77/06;H01L21/312;H01L21/316;H01L21/768 主分类号 C08G77/06
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