发明名称 |
SILOXANE POLYMER, METHOD FOR PRODUCING THE SAME, COATING LIQUID FOR FORMING POROUS FILM CONTAINING THE POLYMER, POROUS FILM AND SEMICONDUCTOR APPARATUS USING THE POROUS FILM |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To obtain a siloxane polymer that forms a porous film having a more excellent mechanical strength than that of a conventional siloxane polymer by using a siloxane polymer being an industrially preferable material and is synthesized by a new method, a composition for forming a film containing the same, to provide a method for forming a porous film, to obtain a formed porous film and to provide a semiconductor apparatus having the built-in porous film and high performance and high reliability. <P>SOLUTION: The method for producing a siloxane polymer by hydrolysis condensation of a hydrolyzable silane compound comprises preparing a cage compound salt of a silsesquioxane represented by general formula (1): (SiO<SB>1.5</SB>-O)<SB>n</SB><SP>n-</SP>X<SP>+</SP><SB>n</SB>(wherein X is NR<SB>4</SB>; Rs are each a 1-4C straight-chain or branched-chain alkyl group and each independently the same or different; and n is an integer of 6-24) and using a siloxane polymer obtained by hydrolyzing and condensing a hydrolyzable silane compound as the cage compound salt of the silsesquioxane. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2008201832(A) |
申请公布日期 |
2008.09.04 |
申请号 |
JP20070036344 |
申请日期 |
2007.02.16 |
申请人 |
SHIN ETSU CHEM CO LTD;MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
YAGIHASHI FUJIO;HAMADA YOSHITAKA;ASANO TAKESHI;IWABUCHI MOTOAKI;NAKAGAWA HIDEO;SASAKO MASARU |
分类号 |
C08G77/06;H01L21/312;H01L21/316;H01L21/768 |
主分类号 |
C08G77/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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