HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING

摘要

A method for manufacturing a sputtering target is provided to produce a high-density sputtering target having minimal or few pores, and to reduce a production cost. A method for manufacturing a sputtering target from a powder material includes the steps of: (a) providing at least one raw powder material; (b) forming the at least one raw powder material into a green body having a density about 40% greater than a theoretical maximum density; (c) treating the green body with microwaves to form a sintered body having a density about 97% greater than the theoretical maximum density; and (d) forming the sputtering target from the sintered body. Further, the step of (a) is a step of providing at least one raw powder material comprising at least one dielectric materials.