| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition excellent in line edge roughness and improved in pattern collapse. <P>SOLUTION: There are provided a resin which has a repeating unit (a) having a group represented by general formula (I) and of which the solubility in an alkali developer is increased by the action of an acid, a compound forming the resin, and the above positive photosensitive composition and a pattern forming method using the same. In the formula, R<SB>1</SB>represents a (n+1)-valent hydrocarbon group; R<SB>2</SB>represents a hydrogen atom or a monovalent organic group, a plurality of symbols R<SB>2</SB>may be the same or different; R<SB>3</SB>represents a monovalent organic group, R<SB>2</SB>and R<SB>3</SB>may be the same or different and may bond to each other to form a cyclic structure; and n represents an integer of ≥1. <P>COPYRIGHT: (C)2008,JPO&INPIT |
